Photon source - SATT Lutech

Summary

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Technology

Manufacturing of plasmonic (or photonic) nanostructures in which the nano emitters are deterministically and nondestructively placed exactly at the position for which the resonant electromagnetic field is maximum.
- Deterministic electron-beam lithography using fluorescence microscopy images
Combination of optical and electron-beam lithography associated with fluorescence microscopy images to draw electron-beam exposure patterns. Fluorescent emitters (individual or aggregates) are imaged by fluorescence microscopy and at the same step alignment markers are created around them by means of optical lithography on a resist bi-layer covering the emitters. This bi-layer prevents the electrons of the beam from damaging the fluorescent emitters.
- Deterministically aligned optical lithography with spatially shaped laser modes
By generating and utilizing spatially shaped laser modes like donut laser modes, the invention circumvents the problem of emitter bleaching and performs optical lithography centered over a single or aggregates of fluorescent emitters without causing any harm to the emitter.
- Automatic characterization of single emitters
An apparatus and a software method were developed to determine the relevant parameters of the emitters (intensity distributed in wavelength, life-time and g2).

The success of advanced quantum communication relies on non-classical light sources emitting single indistinguishable photons at high flux rates and purity. Controlled positioning of nanoemitters and fabrication of nanostructures are necessary to realize such technologies.
Conventional fabrication methods like scanning electron microscopy or optical lithography involve exposing the emitter directly and destructively to the electrons / laser of the writing beam. Two novel nondestructive manufacturing processes have been successfully developed.

Demontrator: single emitter plasmonic patch antennas with a controlled patch size and circular or elliptical shapes. TRL4
Apparatus for automatic and simultaneous characterization of 10 sources. TRL4